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首页 > 资料下载 > 镀膜仪文章:在极低提拉速度下制备的二氧化硅和二氧化钛膜上自发形成的图案

镀膜仪文章:在极低提拉速度下制备的二氧化硅和二氧化钛膜上自发形成的图案

点击次数:30 发布时间:2020/5/14
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Linear patterns were spontaneously formed on the silica and titania dip-coating films prepared from tetramethyl orthosilicate (Si(OCH 3 ) 4 ) and titanium tetraisopropoxide (Ti(OC 3 H 7 i ) 4 ) solutions, respectively. In both films, the pattern formation occurred at extremely low substrate withdrawal speeds below 1.0 cm min 21 , where the film thickness increased with decreasing substrate withdrawal speed for dip-coating. The linear patterns on micrometre scale were arranged perpendicular to the substrate withdrawal direction. The values of R Z (10 point height of irregularities) and S (mean spacing of local peaks) of the patterns increased with decreasing substrate withdrawal speed.

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